OFR's all-refractive UV Achromatic MicroSpot Focusing Objectives are designed for use with high power, UV excimer lasers and other ultraviolet sources.
Lens elements comprising the LMU Objectives are made from the highest quality, lowest absorption excimer grade fused silica and CaF2 available. For information on material testing under high power UV radiation, the following are recommended:
"Optical Materials for Excimer Laser Applications"
M. Rothschild, Optics & Photonics News, May, 1993
"Long-Term Effects of Pulsed KrF Laser Radiation on Crystalline and
Amorphous SiO2". D.J. Krajnovich, I.K. Pour, SPIE Vol. 2114, Proceedings,
1993 Boulder Damage Symposium
"Excimer Lasers: Applications, Beam Delivery Systems and Laser Design"
SPIE Vol. 1835, Proceedings, Nov. 1992 Boston Conference
"Improvements in Crystal Optics for Excimer Lasers"
Toepke, D. Cope, Harshaw/Bicron Crystal Products Group
Equipped with the universal standard
Royal Microscope Society (RMS) thread
(Whitworth 0.8" x 36 TPI).
UV
MicroSpot Focusing Objective
Catalog
Number
Working
Distance
EFL
NA
Theoretical
Focus Spot
Entrance
Aperture
D
L
LMU-3X-λ
49 mm
60 mm
0.08
5 µm*
10 mm
21 mm
26 mm
LMU-5X-λ
35 mm
40 mm
0.13
3 µm*
10 mm
21 mm
24 mm
LMU-10X-λ
15 mm
20 mm
0.25
2 µm*
10 mm
21 mm
32 mm
LMU-15X-λ
8.5 mm
13 mm
0.32
1 µm*
8.5 mm
21 mm
36 mm
LMU-20X-λ
4 mm
10 mm
0.40
1 µm*
8 mm
21 mm
35 mm
LMU-39X-λ**
2 mm
5 mm
0.50
1 µm*
5 mm
21 mm
34 mm
LMU-40X-λ
1 mm
5 mm
0.50
1 µm*
5 mm
21 mm
34 mm
LMUL-20X-λ
19 mm
10 mm
0.40
Discuss
8 mm
See drawing
When ordering, specify coating according
to wavelength and power rating by adding the appropriate coating
code, for example, LMUL-20X-266 or LMU-10X-UVB.
* Note that Theoretical Focal Spot Diameter values are based
on a Gaussian profile input beam at Design Wavelength which
fills the Entrance Aperture at the 1/e2 limits.
**
Optimized for use 325 - 650nm. Inquire for coating options.
† ZERO-POWER ACHROMATIZER available, See page 7.